Processing apparatus, recording medium, substrate processing method, and method of manufacturing semiconductor device

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus, to perform a process,

• wherein the substrate processing apparatus includes a controller configured to set a plurality of temperature control items to create a recipe and execute the recipe thus created to process a substrate, and
• wherein the process comprising:
• storing at least a temperature control table in which a set value of a heater configured to heat the substrate and a set value of a lamp configured to heat the substrate are set for a target temperature of the substrate, and a process recipe configured to process the substrate;
• searching the temperature control table with a target temperature corresponding to a substrate temperature set in the process recipe;
• setting a set value for the target temperature corresponding to the substrate temperature to at least one selected from the group of a temperature set value of the heater, a temperature ratio of the heater, a power set value of the lamp, and a lamp rate value in the process recipe;
• when the substrate temperature set in the process recipe is equal to or higher than a predetermined temperature, turning on a temperature function selection flag and setting a lamp control value including at least the power set value of the lamp and the lamp rate value;
• and
• executing the process recipe.

A substrate processing method, comprising:

• storing at least a temperature control table in which a set value of a heater configured to heat a substrate and a set value of a lamp configured to heat the substrate are set for a target temperature of the substrate, and a process recipe configured to process the substrate;
• searching the temperature control table with a target temperature corresponding to a substrate temperature set in the process recipe;
• setting a set value for the target temperature corresponding to the substrate temperature to at least one selected from the group of a temperature set value of the heater, a temperature ratio of the heater, a power set value of the lamp, and a lamp rate value in the process recipe;
• when the substrate temperature set in the process recipe is equal to or higher than a predetermined temperature, turning on a temperature function selection flag and setting a lamp control value including at least the power set value of the lamp and the lamp rate value;
• and
• executing the process recipe.