Growth monitor system and methods for film deposition
AssigneeApplied Materials, Inc.
InventorsZhepeng Cong, Mostafa Baghbanzadeh, Tao Sheng, Enle Choo
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Abstract
The present disclosure generally relates to process chambers for semiconductor processing. In one embodiment, a growth monitor for substrate processing is provided. The growth monitor includes a sensor holder and a crystal disposed in the sensor holder having a front side and a back side. An opening is formed in the sensor holder exposing a front side of the crystal. A gas inlet is disposed through the sensor holder to a plenum formed by the back side of the crystal and the sensor holder. A gas outlet is fluidly coupled to the plenum.
Claims20
A method of measuring a characteristic for substrate processing, the method comprising:
- flowing a process gas over a growth monitor comprising a crystal;
- flowing a back side gas over a back side of the crystal;
- purging a front side of the crystal using a front side purge gas;
- and
- measuring the characteristic of the process gas using the crystal, wherein measuring the characteristic of the process gas occurs when the front side of the crystal is not being purged, and purging the front side of the crystal is cyclically alternated with measuring the characteristic.
A method of measuring a characteristic for substrate processing, the method comprising:
- flowing a process gas on a first side of a sensor;
- flowing a gas on a second side of the sensor;
- measuring the characteristic of the process gas using the sensor;
- and
- purging the first side of the sensor using a purge gas when the characteristic is not being measured.
A film growth monitor comprising:
- a sensor holder;
- a crystal disposed in the sensor holder, the crystal having a first side and a second side;
- an opening formed in the sensor holder on the first side;
- a gas inlet disposed through the sensor holder to a plenum formed by the second side of the crystal and the sensor holder;
- a gas outlet fluidly coupled to the plenum;
- and
- a controller configured to:
- flow a process gas on the first side of the crystal,
- flow a gas on the second side of the crystal,
- measure the characteristic of the process gas using the crystal, and
- purge the first side of the sensor using a purge gas when the characteristic is not being measured.
Dependencies are inferred from the claim text.