Method for manufacturing image display device including forming conductive layer having single-crystal metal part

A method for manufacturing an image display device, the method comprising:

• preparing a first substrate that comprises:
• a circuit element formed on a substrate,
• a first wiring layer connected to the circuit element, and
• a first insulating film covering the circuit element and the first wiring layer;
• forming a conductive layer on the first insulating film, the conductive layer comprising a first part, the first part being made of a single-crystal metal;
• forming a semiconductor layer on the first part, the semiconductor layer comprising a light-emitting layer;
• forming a light-emitting element by patterning the semiconductor layer, the light-emitting element including:
• a light-emitting surface on the first part, and
• a top surface at a side opposite to the light-emitting surface;
• forming a second insulating film covering the first insulating film, the conductive layer, and the light-emitting element;
• forming a first via extending through the first and second insulating films;
• forming a second wiring layer on the second insulating film;
• and
• removing at least a portion of the first part on the light-emitting surface, wherein:
• the first via is located between the first wiring layer and the second wiring layer and electrically connects the first wiring layer and the second wiring layer.