US 12,770,831 B2 · Ion source and operating method thereof

Abstract

An ion source includes a vaporizer, a plasma chamber, and a controller. The vaporizer produces a reaction product by supplying, through a first gas supply line to a crucible in which a solid material is installed, a reactive gas that reacts with the solid material, and vaporizes the reaction product by heating the crucible with a heater. The plasma chamber is supplied with a vapor from the vaporizer through a vapor supply line, and has a second gas supply line connected to the plasma chamber separately from the vapor supply line. The controller controls the heater to heat the crucible while a gas is being supplied from the second gas supply line to the plasma chamber and stops a supply of the reactive gas through the first gas supply line to the crucible.

Claims13

Dependent claims

An ion source comprising:

a vaporizer which produces a reaction product by supplying, through a first gas supply line to a crucible in which a solid material is installed, a reactive gas that reacts with the solid material, and which vaporizes the reaction product by heating the crucible with a heater;
a plasma chamber to which a vapor is supplied from the vaporizer through a vapor supply line, a second gas supply line being connected to the plasma chamber separately from the vapor supply line;
and
a controller that is configured to control the heater to heat the crucible while a gas is being supplied from the second gas supply line to the plasma chamber and to stop a supply of the reactive gas through the first gas supply line to the crucible.

1 more element

An ion source comprising:

a vaporizer including a crucible containing a solid material which reacts with a reactive gas to produce a reaction product which, when heated, generates a vapor;
a heater configured to heat the crucible;
a plasma chamber communicatively connected to the vaporizer by a vapor supply line and configured to generate a plasma from the vapor or from a source gas supplied thereto;
a source gas supply line communicatively connected to the plasma chamber and through which the source gas is supplied to the plasma chamber;
a reactive gas supply line communicatively connected to the vaporizer through which the reactive gas is supplied to the vaporizer;
and
a controller that is configured to control the heater to heat the crucible while supplying the source gas to the plasma chamber through the source gas supply line, and to switch a source of the plasma from the vapor to the source gas by stopping the reactive gas from being supplied through the reactive gas supply line to the crucible.

4 more elements

Dependencies are inferred from the claim text.

Ion source and operating method thereof

Life of this patent

Ion source and operating method thereof

Life of this patent

Abstract

Claims13