Support device, support method, substrate processing system, and storage medium
AssigneeSCREEN Holdings Co., Ltd.
InventorsTakashi Ikeuchi, Takehiro Sano
Life of this patent
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AssigneeSCREEN Holdings Co., Ltd.
InventorsTakashi Ikeuchi, Takehiro Sano
Estimating the term…
A support device supports adjustment of values of parameters of a substrate processing apparatus. The parameters include detection target parameters of which corresponding physical quantities are to be detected. An arithmetic processing section of the support device builds a predictive model through a first machine leaning model performing learning of quality data and detection data pieces relating to the physical quantities. The arithmetic processing section acquires detection data recommended values by executing Bayesian optimization based on the predictive model, an acquisition function, and a search range. The arithmetic processing section causes a second machine learning model to perform learning of the detection data pieces and values of the parameters. The arithmetic processing section outputs parameter recommended values by inputting the detection data recommended values to the second machine learning model having performed the learning.
A support device that supports adjustment of values of parameters of a substrate processing apparatus that operates based on the parameters to perform substrate processing, the parameters including detection target parameters of which corresponding physical quantities are to be detected, the support device comprising
A support method for supporting adjustment of values of parameters of a substrate processing apparatus that operates based on the parameters to perform substrate processing, the parameters including detection target parameters of which corresponding physical quantities are to be detected, the support method comprising:
Dependencies are inferred from the claim text.