Apparatus and method for semiconductor oxide film ellipsometric amplitude sensor
AssigneeKorea Research Institute of Standards and Science
InventorsHyun Mo Cho, Dong Hyung Kim, Wook Choi
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AssigneeKorea Research Institute of Standards and Science
InventorsHyun Mo Cho, Dong Hyung Kim, Wook Choi
Estimating the term…
An elliptical amplitude sensor device including a semiconductor oxide film, a micro-channel structure including a support, a dielectric thin film formed on a substrate formed on the support, a cover unit having an incidence window and a reflection window on one side and the other side, respectively, and provided on the support, and a micro-channel formed by combination of the cover unit and the support; a sample injection unit on the dielectric thin film, an adsorption layer for the sample; a polarization generation unit which irradiates polarized incident light through the incidence window onto the adsorption layer at an incident angle θ that satisfies p-wave or s-wave anti-reflection conditions; and a polarization detection unit which separately measures the p-wave reflectance and s-wave reflectance of reflected light reflected from the adsorption layer and passing through the reflection window to detect an ellipsometric amplitude angle.
An apparatus for a semiconductor oxide film ellipsometric amplitude sensor, comprising:
An apparatus for a semiconductor oxide film ellipsometric amplitude sensor, comprising:
An apparatus for a semiconductor oxide film ellipsometric amplitude sensor, comprising:
Dependencies are inferred from the claim text.