Detection of chamber sealing leakage

A sealing monitoring system for a chamber, comprising:

• a plurality of sealing monitoring devices each comprising:
• a support attached to a front of a sputtering target;
• at least a pressure sensor attached to the support, positioned vertically between the front of the sputtering target and a top of a shield of the chamber parallel to each other, laterally positioned at a location adjacent to a sealing device of the chamber, and configured to sense a pressure at the location and generate a voltage signal based on the pressure;
• and
• a radio frequency (RF) chip electrically connected to the sensor and configured to transmit the voltage signal;
• and
• a processor configured to receive the voltage signal and to determine a sealing condition adjacent to the location based on the voltage signal.

A method of monitoring a sealing condition of a chamber, comprising:

• allocating a plurality of sealing monitoring devices on a front of a sputtering target, wherein each of the plurality of sealing monitoring devices comprises:
• a support attached to the front of the sputtering target;
• and
• at least a pressure sensor attached to the support, positioned vertically between the front of the sputtering target and a top of a shield of the chamber parallel to each other, and laterally positioned adjacent to a sealing device of the chamber;
• sensing, by the sensor, a pressure at a location of one of the plurality of sealing monitoring devices, wherein a voltage signal is generated by the sensor based on the pressure and is transmitted by a radio frequency (RF) chip;
• comparing, by the processor, the voltage signal with a threshold value, wherein the threshold value is stored in the processor;
• and
• determining, by the processor, a sealing condition of the sealing device adjacent to the location based on a result of the comparing of the voltage signal with the threshold value.