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US 12,768,593 B2Granted
Substrate processing apparatus and method of processing a substrate using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsSangjine Park, Ji Hwan Park, Kuntack Lee
Life of this patent
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Abstract
A method of processing a substrate includes disposing a substrate in a drying chamber, and supplying a fluid into the drying chamber in which the substrate is disposed. The supplying of the fluid into the drying chamber includes supplying a gas into the drying chamber, and supplying a supercritical fluid into the drying chamber after the supplying of the gas is started.
Claims20
A method of processing a substrate, the method comprising:
- disposing the substrate in a drying chamber;
- and
- supplying a fluid into the drying chamber in which the substrate is disposed,
- wherein the supplying of the fluid into the drying chamber comprises:
- supplying, after the disposing of the substrate in the drying chamber, a gas into the drying chamber;
- and
- supplying, after the supplying of the gas into the drying chamber, a supercritical fluid of the gas into the drying chamber.
4 more elements
A method of processing a substrate, the method comprising:
- wet-processing the substrate;
- and
- dry-processing the substrate wet-processed,
- wherein the dry-processing of the substrate comprises:
- disposing the substrate in a drying chamber;
- supplying, after the disposing of the substrate in the drying chamber, a gas into the drying chamber to increase a pressure in the drying chamber to a first pressure;
- and
- supplying, after the supplying of the gas into the drying chamber, a supercritical fluid of the gas into the drying chamber after the pressure in the drying chamber reaches the first pressure.
5 more elements
A substrate processing apparatus comprising:
- a drying chamber;
- a gas supply unit including a gas tank configured to store a gas,
- wherein the gas supply unit is configured to supply the gas into the drying chamber;
- and
- a supercritical fluid supply unit connected to the gas tank and configured to supply a supercritical fluid of the gas into the drying chamber,
- wherein the drying chamber comprises:
- a drying chamber housing providing a drying space;
- and
- a drying chuck in the drying chamber housing.
6 more elements
Dependencies are inferred from the claim text.