Amorphous carbon coating method for rubber roller
AssigneeINNOTION TECH Co., Ltd.
InventorsJeong Ki Hong, In Ki Hong, Myoung Ki Hong, Sung Gyu Hong
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Abstract
The present invention relates to a carbon coating method for a rubber roller, in which a DLC (Diamond-Like Carbon) coating is applied to the surface of the rubber roller using an ion source. In order to prevent problems such as surface cracks caused by heat and ultraviolet radiation generated during the plasma-based coating process, the method controls the coating cycle by distributing the coating time and aging time (also referred to as cooling time) into a single unit coating cycle.
Claims11
A method for forming a DLC (Diamond-Like Carbon) coating layer on a surface of a rubber roller, the method comprising:
- alternately repeating a deposition process for forming the DLC coating layer and a cooling process in order to prevent deformation of the rubber roller surface caused by heat generation or ultraviolet radiation emitted by plasma during the coating process,
- wherein the DLC coating layer is formed within a time range that does not cause deformation of the rubber roller surface, followed by a cooling period,
- wherein the cooling process comprises either pausing the process or supplying an inert gas at room temperature into the chamber,
- the ratio of a deposition time to a cooling time for forming the DLC coating layer is in the range of 1:⅓ to 1,
- wherein a buffer layer is formed prior to the formation of the DLC (Diamond-Like Carbon) coating layer,
- the buffer layer comprises one of CrN and CrC, TiN and TiC, or WN and WC, and is formed using a physical Vapor Deposition (PVD) source equipped with a sputter target of one of Cr, Ti, or W;
- the formation of the CrN, TiN, or WN layer is carried out by applying power to the PVD source equipped with the sputter target and supplying an inert gas and nitrogen (N2), wherein only the inert gas is supplied at the initial stage and the nitrogen supply is gradually increased to form a gradient layer;
- the CrC, TiC, or WC layer is formed by applying power to the PVD source equipped with the sputter target and supplying an inert gas and a hydrocarbon gas;
- the cooling time is provided after the buffer layer formation;
- and
- a ratio of a buffer layer formation time to the cooling time after the buffer layer formation is in the range of 1:
- ⅓ to 1.
Dependencies are inferred from the claim text.