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US 12,766,739 B2Granted
Processing system
AssigneeTokyo Electron Limited
InventorKento Tokairin
Life of this patent
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Abstract
A disclosed processing system includes a substrate placing stage, at least one measurer, and a determiner. The substrate placing stage is configured to place a substrate transferred by a transfer device thereon. The at least one measurer measures a load applied to the substrate placing stage from the substrate when the substrate is transferred from the transfer device onto the substrate placing stage. The determiner determines a suitability of a fixed state of the substrate to the transfer device based on the load measured by the at least one measurer.
Claims14
A processing system comprising:
- a substrate placing stage configured to place a substrate thereon;
- at least one measurer configured to measure a load applied to the substrate from the substrate placing stage when the substrate is transferred from a transfer device to the substrate placing stage;
- and
- a determiner configured to determine a suitability of a fixed state of the substrate to the transfer device based on the load measured by the at least one measurer.
1 more element
Dependencies are inferred from the claim text.