Solvent vapor supply apparatus and solvent vapor supply method
AssigneeTokyo Electron Limited
InventorYuichiro Miyata
Life of this patent
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Abstract
A solvent vapor supply apparatus is for supplying solvent vapor to a substrate treatment. The solvent vapor supply apparatus includes a solvent storage which is kept warm at a temperature equal to or higher than a saturation temperature of a solvent stored therein; a precooler which precools the solvent vapor generated in the solvent storage; and a temperature regulator which regulates a temperature of the precooled solvent vapor to a target temperature when the solvent vapor is supplied to the substrate treatment apparatus. The temperature regulator supplies the solvent vapor regulated to the target temperature to the substrate treatment apparatus.
Claims15
A solvent vapor supply apparatus for supplying solvent vapor to a substrate treatment apparatus, the solvent vapor supply apparatus comprising:
- a solvent storage configured to be kept warm at a temperature equal to or higher than a saturation temperature of a solvent stored therein;
- a precooler configured to precool the solvent vapor generated in the solvent storage;
- and
- a temperature regulator configured to regulate a temperature of the precooled solvent vapor to a target temperature when the solvent vapor is supplied to the substrate treatment apparatus, wherein
- the solvent storage has a heater which heats the solvent,
- the temperature regulator has a cooler which cools the solvent vapor, and
- the temperature regulator is configured to supply the solvent vapor regulated to the target temperature to the substrate treatment apparatus.
A solvent vapor supply method of supplying solvent vapor to a substrate treatment apparatus, the solvent vapor supply method comprising:
- generating the solvent vapor by heating a solvent with a heater provided in a solvent storage;
- precooling the solvent vapor generated in the generating the solvent vapor;
- and
- regulating a temperature of the solvent vapor, by cooling the precooled solvent vapor with a cooler provided in a temperature regulator, to a target temperature when supplying the solvent vapor to the substrate treatment apparatus, and supplying the solvent vapor regulated to the target temperature to the substrate treatment apparatus.
Dependencies are inferred from the claim text.