Substrate cleaning apparatus and substrate cleaning method

A substrate cleaning method comprising:

• a cleaning step of cleaning a rotating substrate by rotating a cleaning tool and brining the cleaning tool into contact with a surface of the rotating substrate, wherein a holding mechanism holds the cleaning tool during the cleaning step;
• a moving step of moving the cleaning tool away from the substrate and into contact with a self-cleaning tool, wherein the holding mechanism holds the cleaning tool during the moving step;
• a self-cleaning step of self-cleaning the cleaning tool by rotating the cleaning tool and contacting the cleaning tool with the self-cleaning member while the cleaning tool is in contact with a liquid;
• and
• a sensing step of sensing a temperature of the liquid during the self-cleaning step,
• wherein a controller controls pressing of the cleaning tool first against the rotating substrate and subsequently against the self-cleaning member, wherein the controller is configured to receive the sensed temperature of the liquid, and wherein the controller is configured to control the holding mechanism such that the cleaning tool is pressed against the self-cleaning member with a first pressing force in response to the sensed temperature being a first temperature and to control the holding mechanism such that the cleaning tool is pressed against the self-cleaning member with a second pressing force in response to the sensed temperature being a second temperature, wherein the second pressing force is larger than the first pressing force, and wherein the second temperature is higher than the first temperature.