Method for manufacturing an image display device including roughening a light-emitting surface

A method for manufacturing an image display device, the method comprising:

• preparing a first substrate that comprises:
• a circuit element formed on a first surface of a substrate,
• a first wiring layer connected to the circuit element, and
• a first insulating film covering the circuit element and the first wiring layer;
• forming a graphene-including layer on the first insulating film;
• forming a semiconductor layer on the graphene-including layer, the semiconductor layer comprising a light-emitting layer;
• forming a light-emitting element by patterning the semiconductor layer, the light-emitting element including:
• a light-emitting surface on the graphene-including layer, and
• a top surface at a side opposite to the light-emitting surface;
• forming a second insulating film covering the first insulating film, the graphene-including layer, and the light-emitting element;
• forming a first via extending through the first and second insulating films;
• and
• forming a second wiring layer on the second insulating film;
• removing the substrate;
• forming a wavelength conversion member in place of the substrate that has been removed;
• and
• exposing the light-emitting surface and roughening the light-emitting surface by forming an opening extending through the first insulating film, wherein:
• the first via is located between the first wiring layer and the second wiring layer and electrically connects the first wiring layer and the second wiring layer.