Monitoring substrate and monitoring method
AssigneeTokyo Electron Limited
InventorIsamu Taoda
Life of this patent
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Abstract
A monitoring substrate for monitoring an inside of a substrate processing apparatus comprises a position detection sensor, a camera, a light source, a storage part and a controller. The position detection sensor configured to detect a position of the monitoring substrate, the camera configured to capture an image of the inside of the substrate processing apparatus maintained at a vacuum atmosphere, the light source configured to illuminate the inside of the substrate processing apparatus, the storage part configured to store the image captured by the camera, and the controller configured to control the camera and the light source.
Claims11
A monitoring substrate for monitoring an inside of a substrate processing apparatus, comprising:
- a position detection sensor configured to detect moving direction and acceleration of the monitoring substrate;
- a camera configured to capture an image of the inside of the substrate processing apparatus maintained at a vacuum atmosphere;
- a light source configured to illuminate the inside of the substrate processing apparatus;
- a storage part configured to store the image captured by the camera;
- and
- a controller configured to control the camera and the light source,
- wherein the position detection sensor is configured to output direction data and acceleration data of the monitoring substrate to the controller, and
- wherein the controller is configured, based on the direction data and the acceleration data, to detect the position of the monitoring substrate and to control the camera and the light source to capture images.
A monitoring method for a monitoring substrate configured to monitor an inside of a substrate processing apparatus, wherein the monitoring substrate includes:
- a position detection sensor configured to detect moving direction and acceleration of the monitoring substrate;
- a camera configured to capture an image of the inside of the substrate processing apparatus maintained at a vacuum atmosphere;
- a light source configured to illuminate the inside of the substrate processing apparatus;
- a storage part configured to store the image captured by the camera;
- and
- a wireless communication part configured to perform wireless communication with the substrate processing apparatus,
- the monitoring method comprising:
- allowing the substrate processing apparatus to transfer the monitoring substrate to a part of the inside of the substrate processing apparatus that is maintained at a vacuum atmosphere;
- allowing the position detection sensor to output direction data and acceleration data of the monitoring substrate,
- controlling the camera and the light source to allow the monitoring substrate to capture an image based on the direction data and the acceleration data;
- allowing the monitoring substrate to store the position of the monitoring substrate where the image was captured in association with the image in the storage part, based on the direction data and the acceleration data;
- allowing the substrate processing apparatus to transfer the monitoring substrate to a part of the inside of the substrate processing apparatus that is maintained at an atmospheric atmosphere;
- allowing the monitoring substrate to transmit the stored image to the substrate processing apparatus by the wireless communication when the monitoring substrate is transferred to the part maintained at the atmospheric atmosphere;
- and
- allowing the substrate processing apparatus to estimate cleaning timing based on RGB values and brightness values of the received image.
Dependencies are inferred from the claim text.