Generating whole substrate drop patterns with repeating evaluation regions

A method comprising:

• generating N whole substrate drop patterns for a test substrate, wherein each whole substrate drop pattern of the N whole substrate drop patterns has M repeating drop patterns in repeating evaluation regions of the test substrate with predetermined dimensions and corresponds to a film to be formed from drops that have been deposited on the test substrate, wherein each whole substrate drop pattern of the N whole substrate drop patterns is different from all other whole substrate drop patterns of the N whole substrate drop patterns, wherein M is two or more, and wherein the M repeating drop patterns are identical to each other;
• calculating, for each of the N whole substrate drop patterns, respective statistical parameters of distributions of Q physical attributes of the M repeating drop patterns, wherein the Q physical attributes are related to a thickness of a top layer of the film above substrate features of the test substrate, wherein a respective distribution of the distributions is calculated for each physical attribute of the Q physical attributes, and wherein P respective statistical parameters of the statistical parameters are calculated for each distribution of the distributions;
• determining N figures of merit, wherein each of the N figures of merit is determined for a respective whole substrate drop pattern of the N whole substrate drop patterns based on the respective statistical parameters of the respective whole substrate drop pattern;
• selecting, from the N whole substrate drop patterns, a satisfactory whole substrate drop pattern that has a satisfactory figure of merit among the N figures of merit;
• depositing drops of formable material onto a product substrate according to the satisfactory whole substrate drop pattern;
• and
• planarizing the drops to form a planarized film on the product substrate,
• wherein N, M, P, and Q are positive integers, and
• wherein N is two or more.