Fabrication of near net-shaped silicon carbide structures

A method of manufacturing a target structure, comprising:

• obtaining a model structure of an initial material composition having a predetermined geometry and dimensions;
• applying a slurry mixture into the model structure;
• and
• processing the model structure with the slurry mixture inside the model structure to convert the initial material composition of the model structure into a final material composition to obtain the target structure with the final material composition and having a geometry and dimensions that are substantially similar to the predetermined geometry and dimensions of the model structure, wherein:
• the processing the model structure with the slurry mixture inside the model structure comprises:
• generating a product of a first reaction between two or more components of the slurry mixture inside the model structure;
• and
• converting the model structure to the target structure through a second reaction based on the product of the first reaction;
• the model structure comprises a plurality of pores, and wherein the applying the slurry mixture into the model structure comprises applying the slurry mixture into the plurality of pores of the model structure;
• the slurry mixture comprises one or more silicon (Si) particles coated with silicon dioxide (SiO2) exterior layers that are half oxide silicon particles (HOSP) having a molar ratio of Si to SiO2 to be around one;
• and
• the Si particles coated with SiO2 is are prepared by a process including:
• providing a plurality of Si particles in a fluidized bed chamber;
• flowing oxygen (O2) over the plurality of Si particles at a temperature between 900° C. and 1100° C. in the fluidized bed chamber to cause surface oxidation of the plurality of Si particles to form SiO2;
• and
• stopping flowing O2 when the molar ratio of Si to SiO2 is around one.