Interstitially mixed self-assembled monolayers and method of manufacturing the same by ReSEM

A method of manufacturing a mixed self-assembled monolayer comprising:

• (i) forming a self-assembled monolayer (SAM) including a matrix molecule represented by the following [Formula 1] on a substrate using a solution of the matrix molecule;
• HS
• -
• (
• C
• n
• ⁢
• H
• 2
• ⁢
• n
• +
• 1
• )
• -
• head
• ⁢
• group
• [
• Formula
• ⁢
• 1
• ]
• (ii) immersing the SAM formed in step (i) in a reinforcement molecule solution represented by the following [Formula 2] to induce a substitution reaction on a surface of the substrate thereby to form an intermediate mixed self-assembled monolayer (intermediate mixed SAM);
• HS
• -
• (
• C
• m
• ⁢
• H
• 2
• ⁢
• m
• +
• 1
• )
• [
• Formula
• ⁢
• 2
• ]
• (iii) immersing the intermediate mixed SAM formed in step (ii) in the solution of the matrix molecule again to form an interstitial mixed SAM;
• and
• (iv) repeating steps (ii) to (iii) k times to induce repeated surface exchange of molecules (n ReSEM cycles) thereby forming an interstitially mixed self-assembled monolayer with minimized supramolecular defects, wherein k is an integer of 2 or more,
• n and m are each an integer from 1 to 50, with the proviso that n>m, and
• wherein the head group in [Formula 1] is a substituted or unsubstituted bipyridyl group.