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US 12,757,679 B2Granted
Electrostatic chuck and related methods and structures
AssigneeEntegris, Inc.
InventorsCarlo Waldfried, Jakub Rybczynski, Florentina Popa, Murat Yaldizli
Life of this patent
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Abstract
Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, and electrostatic chuck base components prepared by an additive manufacturing technique.
Claims19
An electrostatic chuck base comprising:
- an upper base surface;
- a lower base surface;
- an interior portion between the upper base surface and the lower base surface;
- and
- a channel within the interior portion, the channel comprising:
- an inlet at a surface of the chuck base;
- an outlet at a surface of the chuck base;
- a length between the inlet and the outlet;
- and
- a cross section along the length that comprises
- a varied cross-sectional area along the length,
- a varied cross-sectional shape along the length, or
- a varied distance from the upper surface along the length,
- wherein the channel defines a first, closed loop flow path from the inlet to the outlet covering a first half of the electrostatic chuck base and a second, closed loop flow path from the inlet to the outlet covering a second half of the electrostatic chuck base.
11 more elements
Dependencies are inferred from the claim text.