Method of manufacturing display device
AssigneeSamsung Display Co., Ltd.
InventorsJung-Hun Noh, Guanghai Jin, Ju-Won Yoon
Life of this patent
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Abstract
A method of manufacturing a display device includes forming an active pattern including a semiconductor area on a substrate, forming a first conductive layer including a floating gate electrode overlapping the semiconductor area on the active pattern, forming a second conductive layer including a control gate electrode overlapping the floating gate electrode on the first conductive layer, forming a global line layer including a first global line electrically connected to the control gate electrode on the second conductive layer, providing a first constant voltage to the first global line, and removing the global line layer.
Claims20
A method of manufacturing a display device, the method comprising:
- forming an active pattern including a first conductor area, a semiconductor area adjacent to the first conductor area, and a second conductor area spaced apart from the first conductor area with the semiconductor area interposed therebetween on a substrate;
- forming a first conductive layer including a floating gate electrode overlapping the semiconductor area on the active pattern;
- forming a second conductive layer including a control gate electrode overlapping the floating gate electrode on the first conductive layer;
- forming a global line layer including a first global line electrically connected to the control gate electrode on the second conductive layer;
- providing a first constant voltage to the first global line;
- and
- removing the global line layer.
A method of manufacturing a display device, the method comprising:
- forming an active pattern including a first conductor area, a semiconductor area adjacent to the first conductor area, and a second conductor area spaced apart from the first conductor area with the semiconductor area interposed therebetween on a substrate;
- forming a first conductive layer including a floating gate electrode overlapping the semiconductor area on the active pattern;
- forming a second conductive layer including a control gate electrode overlapping the floating gate electrode on the first conductive layer;
- forming a global line layer including a first global line electrically connected to the second conductor area of the active pattern on the second conductive layer;
- providing a first constant voltage to the first global line;
- removing the global line layer;
- and
- forming a light-emitting element layer on the second conductive layer after the removing the global line layer.
Dependencies are inferred from the claim text.