Semiconductor memory device and method of manufacturing the semiconductor memory device
AssigneeSK hynix Inc.
InventorKang Sik Choi
Life of this patent
Estimating the term…
Loading patent…
AssigneeSK hynix Inc.
InventorKang Sik Choi
Estimating the term…
Provided herein may be a semiconductor memory device and a method of manufacturing the semiconductor memory device. The semiconductor memory device may include a sub-block insulating layer interposed between a first select gate structure and a second select gate structure, a plurality of conductive patterns stacked over first and second select gate structures to be spaced apart from each other, and a channel structure penetrating one of the first and second select gate structures and the plurality of conductive patterns, the channel structure including an inflection point located at a level between the sub-block insulating layer and the plurality of conductive patterns.
A semiconductor memory device, comprising:
A semiconductor memory device, comprising:
Dependencies are inferred from the claim text.
Drawings are temporarily unavailable. Open the PDF at USPTO
From the US filing history. Foreign family members aren’t listed.
With source and drain on different levels, e.g. with sloping channels: the channels comprising vertical portions, e.g. U-shaped channels
EEPROM devices comprising charge-trapping gate insulators: characterised by the top-view layout
Electronic memory devices
About 18 years 9 months of term left · ends 17 Jul 2045 (estimated)
The present application claims priority under 35 U.S.C. § 119(a) to Korean patent application number 10-2022-0051738, filed on Apr. 27, 2022, in the Korean Intellectual Property Office, the entire disclosure of which is incorporated herein by reference.
Various embodiments of the present disclosure generally relate to a semiconductor memory device and a method of manufacturing the semiconductor memory device, and more particularly to a three-dimensional (3D) semiconductor memory device and a method of manufacturing the 3D semiconductor memory device.
A semiconductor memory device includes memory cells capable of storing data. A three-dimensional (3D) semiconductor memory device may include a 3D memory cell array.
FIG. 1 is a block diagram illustrating a semiconductor memory device according to an embodiment of the present disclosure.
FIGS. 2A and 2B are views schematically illustrating the arrangement of a peripheral circuit structure, a memory cell array, a plurality of bit lines, and a horizontal doped semiconductor pattern according to embodiments of the present disclosure.
FIGS. 3A and 3B are circuit diagrams illustrating a memory cell array according to embodiments of the present disclosure.
Specific structural or functional descriptions disclosed herein are merely illustrative for the purpose of describing embodiments according to the concept of the present disclosure. Embodiments according to the concept of the present disclosure can be implemented in various forms, and should not be construed as being limited to the specific embodiments set forth herein.
Hereinafter, the terms ‘first’ and ‘second’ are used to distinguish one component from another component and are not meant to imply a specific number or order of components. The terms may be used to describe various components, but the components are not limited by the terms. It will be understood that when an element or layer etc., is referred to as being “on,” “connected to” or “coupled to” another element or layer etc., it can be directly on, connected or coupled to the other element or layer etc., or intervening elements or layers etc., may be present. In contrast, when an element or layer etc., is referred to as being “directly on,” “directly connected to” or “directly coupled to” another element or layer etc., there are no intervening elements or layers etc., present. Like numerals refer to like elements throughout. As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items.
Various embodiments of the present disclosure are directed to a semiconductor memory device that is capable of securing an alignment margin and improving operational reliability, and a method of manufacturing the semiconductor memory device.