Color-resist compositions and display panels
AssigneesHuizhou China Star Optoelectronics Display Co., Ltd., Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
InventorsJi Li, Xia Zhang
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Abstract
Embodiments of the present disclosure provide a color-resist composition and a display panel, and the color-resist composition includes a photocurable resin and a photosensitive monomer. The photosensitive monomer has a chemical structure provided by the embodiments of the present disclosure. The photocurable resin is correspondingly selected from the photocurable resin in the embodiments of the present disclosure. The crosslinking degree of the photocurable resin can be enhanced by adding the photosensitive monomer to the photocurable resin during a preparation process to form a color-resist film layer, which improves the overall performance of the display panel.
Claims20
A color-resist composition, comprising:
- a photocurable resin;
- and
- a photosensitive monomer;
- wherein the photosensitive monomer is represented by the following chemical structure:
- wherein R is an alkyl group containing any one of an ether group, —OH, and —COOH, and R1 is selected from any one of —OH, —COOH, and an alkyl group containing any one of —OH and —COOH;
- wherein a relative molecular mass of the photosensitive monomer ranges from 500 to 1200, and the photosensitive monomer contains —COOH.
A color-resist composition, comprising:
- a photocurable resin;
- and
- a photosensitive monomer;
- wherein the photosensitive monomer is represented by the following chemical structure:
- wherein R is an alkyl group containing any one of an ether group, —OH, and —COOH, R1 is selected from any one of —OH, —COOH, and an alkyl group containing any one of —OH and —COOH.
A display panel, comprising:
- a liquid crystal layer;
- and
- a color-resist layer disposed on a light-emitting side of the liquid crystal layer;
- wherein a material of the color-resist layer is prepared from a color-resist composition, and the color-resist composition comprises:
- a photocurable resin;
- and
- a photosensitive monomer;
- wherein the photosensitive monomer is represented by the following chemical structure:
- wherein R is an alkyl group containing any one of an ether group, —OH, and —COOH, and R1 is selected from any one of —OH, —COOH, and an alkyl group containing any one of —OH and —COOH.
Dependencies are inferred from the claim text.