Functionalized carbon particle CMP slurry dispersion

Abstract

The invention provides a chemical mechanical polishing solution for metal and metal nitride substrates. The invention includes a solvent and functionalized carbon-based particles having oxygen-containing functional groups. The functionalized carbon-based particles have oxygen-containing functional groups that react with a peroxy moiety to increase oxygen to carbon atomic ratio on the functionalized carbon-based particles. The functionalized carbon-based particles contain at least 10 weight percent of an sp3-containing structure, the functionalized carbon-based particles include at least 0.01 atomic percent oxygen and a surface of the functionalized carbon-based particles has an atomic oxygen to carbon ratio of at least 0.01. The solution also includes an oligomer or polymer having at least 50 mol % R1-C(O)—N[—R2, —R3] units wherein R1, R2, —R3 are selected from at least one of H, saturated or unsaturated aromatic or aliphatic groups, aryl, cycloaliphatic hydrocarbon or a mixture thereof.

Dependencies are inferred from the claim text.