Wafer storage device with particle-attraction object

A wafer storage device, comprising:

• a floor, a ceiling, and one or more walls between the floor and the ceiling to define a wafer storage chamber for storage of one or more wafers;
• a support frame disposed within the wafer storage chamber and configured to support the one or more wafers;
• a first particle-attraction object, having a positive charge, in the wafer storage chamber and configured to attract negatively charged particles in the wafer storage chamber;
• a second particle-attraction object, having a negative charge, in the wafer storage chamber and configured to attract positively charged particles in the wafer storage chamber;
• a third particle-attraction object, having a positive charge or a negative charge, in the wafer storage chamber and configured to attract negatively charged particles or positively charged particles in the wafer storage chamber;
• and
• a scale disposed underneath at least one of the first particle-attraction object, second particle-attraction object, or the third particle-attraction object to measure a weight of the at least one of the first particle-attraction object, second particle-attraction object, or the third particle-attraction object, wherein:
• one of the first particle-attraction object or the second particle-attraction object is disposed between a first wall of the one or more walls and the support frame such that a line extending perpendicular to the first wall intersects the one of the first particle-attraction object or the second particle-attraction object and the support frame,
• a second one of the first particle-attraction object or the second particle-attraction object is disposed such that no line extending perpendicular to the first wall and intersecting the support frame also intersects the second one of the first particle-attraction object or the second particle-attraction object, and
• the third particle-attraction object is aligned with the second one of the first particle-attraction object or the second particle-attraction object such that a second line extending perpendicular to the first wall intersects the third particle-attraction object and the second one of the first particle-attraction object or the second particle-attraction object.

A system, comprising:

• a first wafer storage chamber configured to store one or more wafers, the first wafer storage chamber defined by a floor, a ceiling, and one or more walls between the floor and the ceiling;
• a support frame disposed within the first wafer storage chamber and configured to support the one or more wafers;
• a first particle-attraction object, having a positive charge, in the first wafer storage chamber and configured to attract negatively charged particles in the first wafer storage chamber;
• a second particle-attraction object, having a negative charge, in the first wafer storage chamber and configured to attract positively charged particles in the first wafer storage chamber;
• a third particle-attraction object, having a positive charge or a negative charge, in the first wafer storage chamber and configured to attract negatively charged particles or positively charged particles in the first wafer storage chamber;
• and
• a cleaning tank configured to receive at least one of the first particle-attraction object, the second particle-attraction object, or the third particle-attraction object upon being removed from the first wafer storage chamber, wherein the cleaning tank is configured to remove the negatively charged particles or the positively charged particles from a surface of the at least one of the first particle-attraction object, the second particle-attraction object, or the third particle-attraction object, wherein:
• one of the first particle-attraction object or the second particle-attraction object is disposed between a first wall of the one or more walls and the support frame such that a line extending perpendicular to the first wall intersects the one of the first particle-attraction object or the second particle-attraction object and the support frame,
• a second one of the first particle-attraction object or the second particle-attraction object is disposed such that no line extending perpendicular to the first wall and intersecting the support frame also intersects the second one of the first particle-attraction object or the second particle-attraction object, and
• the third particle-attraction object is aligned with the second one of the first particle-attraction object or the second particle-attraction object such that a second line extending perpendicular to the first wall intersects the third particle-attraction object and the second one of the first particle-attraction object or the second particle-attraction object.