Apparatus and method for plasma measurement

An apparatus for plasma measurement, the apparatus comprising:

• a first conductive layer over a substrate;
• a first dielectric layer over the first conductive layer;
• a second conductive layer over the first dielectric layer;
• a mask layer over the second conductive layer;
• a first hole through the mask layer, the second conductive layer, and the first dielectric layer, the first hole exposing a first portion of the first conductive layer;
• a first readout hole through the mask layer, the second conductive layer, and the first dielectric layer, the first readout hole exposing a second portion of the first conductive layer, the second portion having a greater surface area than the first portion;
• and
• a second readout hole through the mask layer, the second readout hole exposing a third portion of the second conductive layer, the third portion having a greater surface area than the first portion.

A method for plasma measurement, the method comprising a test cycle, the test cycle comprising:

• setting an initial voltage on a capacitor of a remote capacitive sensor;
• loading the remote capacitive sensor into a process chamber;
• performing a plasma process in the process chamber while the remote capacitive sensor is in the process chamber;
• removing the remote capacitive sensor from the process chamber;
• and
• reading out a voltage of the capacitor from the remote capacitive sensor.