Overlay measurement apparatus and overlay measurement method
AssigneeAuros Technology, Inc.
InventorsSeong Yun Choi, Sun Gyun Kim
Life of this patent
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AssigneeAuros Technology, Inc.
InventorsSeong Yun Choi, Sun Gyun Kim
Estimating the term…
Disclosed is a system for optimizing a measurement time of an overlay. According to one embodiment, an overlay measurement apparatus is provided. The overlay measurement apparatus includes a light source configured to direct light to a plurality of overlay targets formed on a wafer; a lens unit including: an objective lens and a lens focus actuator; a detector configured to acquire a focus image; a stage on which the wafer is seated; and a controller configured to: control the lens unit, the detector, and the stage to measure a preset collection-purposed overlay target; collect a target coordinate of the collection-purposed overlay target; calculate a correction value based on the target coordinate; move the stage under application of the correction value; and control the lens unit, the detector, and the stage to measure at least one application-purposed overlay target.
An overlay measurement apparatus comprising:
An overlay measurement method comprising:
Dependencies are inferred from the claim text.