Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method using the raw material for chemical deposition

A chemical deposition method for a ruthenium thin film or a ruthenium compound thin film, comprising vaporizing a raw material to obtain a raw material gas, and introducing a reaction gas and the raw material gas together onto a substrate surface, while heating the raw material gas and the reaction gas,

• wherein the raw material comprises
• an organoruthenium compound represented by the following Formula 1, in which a trimethylenemethane-based ligand (L1), and two carbonyl ligands and a ligand X coordinate to divalent ruthenium:
• RuL1(CO)2X [Formula 1]
• wherein the trimethylenemethane-based ligand (L1) is represented by the following Formula 2, and the ligand X is any one of an isocyanide ligand (L2), a pyridine ligand (L3), an amine ligand (L4), an imidazole ligand (L5), a pyridazine ligand (L6), a pyrimidine ligand (L7), and a pyrazine ligand (L8) represented by the following Formula 3 to Formula 7:
• wherein a substituent R of the ligand L1 is any one of hydrogen, a linear or branched alkyl group having 1 to 8 carbon atoms, a cyclic alkyl group having 3 to 9 carbon atoms, a linear or branched alkenyl group having 2 to 8 carbon atoms, a linear or branched amino group;
• wherein a substituent R1 of the ligand L2 is any one of hydrogen, a linear or branched alkyl group having 1 to 8 carbon atoms;
• wherein each of substituents R2 to R6 of the ligand L3 is any one of hydrogen, a linear or branched alkyl group having 1 to 5 carbon atoms;
• wherein each of substituents R7 to R9 of the ligand L4 is a linear or branched alkyl group having 1 to 5 carbon atoms;
• wherein a substituent R10 of the ligand L5 is any one of hydrogen, a linear or branched alkyl group having 1 to 8 carbon atoms;
• wherein each of substituents R14 to R17 of the ligand L6 is any one of hydrogen, a linear or branched alkyl group having 1 to 5 carbon atomss;
• wherein each of substituents R18 to R21 of the ligand L7 is any one of hydrogen, a linear or branched alkyl group having 1 to 5 carbon atoms;
• and
• wherein each of substituents R22 to R25 of the ligand Lg is any one of hydrogen, a linear or branched alkyl group having 1 to 5 carbon atoms.