Method and system for measurement of optical loss in wafer level testing via wavelength-route division
AssigneeAdvanced Micro Foundry Pte. Ltd.
InventorsShawn Yohanes Siew, Bo Li, Feng Gao, Xianshu Luo
Life of this patent
Estimating the term…
Loading patent…
AssigneeAdvanced Micro Foundry Pte. Ltd.
InventorsShawn Yohanes Siew, Bo Li, Feng Gao, Xianshu Luo
Estimating the term…
Disclosed is a system of measurement for optical loss that includes the light source unit that is further provided to the first fiber port assembly. The first fiber port assembly is connected with the first grating coupler unit. The first grating coupler unit is connected with the splitter unit. The splitter unit diverts the light to the plurality of routes. The plurality of route is combined with the combiner module. The combiner module is connected with the second grating coupler unit. The second grating coupler unit is connected with the second fiber port assembly. The second fiber port assembly is connected with an optical power detector module.
A system for measurement of optical loss in wafer level testing via wavelength route division, comprising:
A method for measuring optical loss in wafer level testing via wavelength route division, the method comprising:
Dependencies are inferred from the claim text.