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US 12,668,485 B2Granted
Inattentive HF concentration vapors phase release of micro-electro-mechanical systems and optical systems
AssigneeUNM Rainforest Innovations
InventorsTito Busani, Ravi Kiran Chityala, Arjun Aryal
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Abstract
A low-cost, conventional release using low concentrations of HF to overcome the stiction of MEMS structure.
Claims15
A method to release micro-electro-mechanical structure (MEMS) from a sacrificial substrate comprising the steps of:
- providing an aqueous solution of hydrofluoric acid;
- locating said substrate a distance from said aqueous solution of hydrofluoric acid;
- exposing said substrate to vapors released from said aqueous solution of hydrofluoric acid until said MEMS structure is released from said substrate;
- and
- said aqueous solution of hydrofluoric acid has a concentration of 1% or less.
2 more elements
Dependencies are inferred from the claim text.