Composite film manufacturing method and organic/inorganic hybrid film manufacturing method

A method for producing a composite film to form a laminate in combination with a base material for on-site use, comprising:

• providing a sputtering device comprising a sputtering chamber and a target (A) that is an inorganic substance solid in a standard state (a temperature of 25° C. and a pressure of 100 KPa) and a gas inlet, the sputtering device being without another target that is a solid organic substance;
• mounting the target (A) on a target installation jig of the sputtering device;
• reducing a pressure inside the sputtering chamber of the sputtering device to a first pressure;
• introducing a mixed gas comprising a sputtering gas and a gas (B) containing an organic compound, the organic compound being supplied as a component constituting the composite film, into the sputtering chamber of the sputtering device such that the sputtering chamber reaches a second pressure that is equal to or greater than the first pressure,
• wherein the introducing of the mixed gas comprises introducing gas streams of both the gases while merging and mixing the gas streams or preparing the mixed gases in advance and introducing the mixed gas;
• and
• then supplying electric power to the target (A) and sputtering the target (A) to form the composite film containing the inorganic substance from the target (A) and the organic compound from the gas (B) contained in the mixed gas on a surface of the base material so as to obtain the laminate combined with the base material for on-site use,
• wherein the target (A) has a band gap in a range of 2.6 to 3.7 eV,
• wherein the composite film is uniform in both film thickness and composition, and
• wherein the base material comprises a resin.