Eccentricity measurement method and measurement system
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsTatsuya Sakuma, Hitoshi Tanaka
Life of this patent
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Abstract
An eccentricity measurement method includes: obtaining optical surface measurement data by measuring, with use of a probe, an optical surface of an object that is a measurement target object; calculating an optical axis center position of the object from the optical surface measurement data; obtaining outline measurement data by measuring, with use of a camera, an outline of the object; calculating an outline center position of the object from the outline measurement data; and calculating an eccentricity that is an amount of deviation between the optical axis center position and the outline center position.
Claims8
An eccentricity measurement method comprising:
- obtaining optical surface measurement data by measuring an optical surface of an object that is a measurement target object with use of a probe;
- calculating an optical axis center position of the object from the optical surface measurement data;
- obtaining outline measurement data by measuring an outline of the object with use of a camera;
- calculating an outline center position of the object from the outline measurement data;
- and
- calculating an eccentricity that is an amount of deviation between the optical axis center position and the outline center position.
A measurement system comprising:
- a measurement machine that includes:
- a probe for measuring an optical surface of an object that is a measurement target object;
- and a camera for measuring an outline of the object;
- and
- a calculator,
- wherein the calculator:
- calculates an optical axis center position of the object from optical surface measurement data obtained by measuring the optical surface of the object with use of the probe;
- calculates an outline center position of the object from outline measurement data obtained by measuring the outline of the object with use of the camera;
- and
- calculates an eccentricity that is an amount of deviation between the optical axis center position and the outline center position.
Dependencies are inferred from the claim text.