Unevenness level inspecting device, unevenness level inspectiing system, and unevenness level inspecting method
AssigneeTopcon Corporation
InventorTakeshi Kikuchi
Life of this patent
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AssigneeTopcon Corporation
InventorTakeshi Kikuchi
Estimating the term…
An unevenness level inspecting device includes a target T at a known distance from a to-be-inspected surface, a traveling unit for traveling on the to-be-inspected surface, a first marker for marking information on the to-be-inspected surface, and a control unit configured to control the first marker, and the control unit calculates a height of the to-be-inspected surface at a measurement position of the target T based on three-dimensional position coordinates of the target input each time the unevenness level inspecting device travels a predetermined distance, and controls the first marker so as to mark unevenness level information indicating a difference between the height of the to-be-inspected surface and a reference height on a corresponding position on the to-be-inspected surface, and the unevenness level information is marked in a color that differs depending on a magnitude of the difference between the height of the to-be-inspected surface and the reference height.
An unevenness level inspecting device comprising:
An unevenness level inspecting method using an unevenness level inspecting device including a target at a known distance from a to-be-inspected surface, a traveling unit for traveling on the to-be-inspected surface, a first marker for marking information on the to-be-inspected surface, and a control unit including at least a processor and a memory, the control unit configured to control the first marker, wherein
Dependencies are inferred from the claim text.