Duty cycle control to achieve uniformity
AssigneeLam Research Corporation
InventorsAlexei M. Marakhtanov, Felix Leib Kozakevich, Bing Ji, John P. Holland, Ranadeep Bhowmick
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Abstract
A method for achieving a first uniformity level in a processing rate across a surface of a substrate is described. The method includes receiving the first uniformity level to be achieved across the surface of the substrate and identifying a first plurality of duty cycles associated with a first plurality of states based on the first uniformity level. The first plurality of states are of a variable of a first radio frequency (RF) signal. The method further includes controlling an RF generator to generate the first RF signal having the first plurality of duty cycles.
Claims20
A method for achieving a uniformity level in a processing rate across a surface of a substrate, comprising:
- receiving a first uniformity level to be achieved across the surface of the substrate;
- identifying a first plurality of duty cycles associated with a first plurality of states based on the first uniformity level, wherein the first plurality of states are of a variable of a first radio frequency (RF) signal;
- receiving a second uniformity level to be achieved across the surface of the substrate;
- identifying a second plurality of duty cycles associated with a second plurality of states based on the second uniformity level, wherein the second plurality of states are of a variable of a second RF signal;
- and
- controlling an RF generator to generate the second RF signal having the second plurality of duty cycles to achieve the second uniformity level, wherein the second RF signal having the second plurality of duty cycles is generated by the RF generator that is coupled to a substrate support of a plasma chamber.
A method for achieving a uniformity level in a processing rate across a surface of a substrate, comprising:
- receiving a first uniformity level to be achieved across the surface of the substrate;
- identifying a first plurality of duty cycles associated with a first plurality of states of a variable based on the first uniformity level, wherein the first plurality of states are of a first plurality of radio frequency (RF) signals;
- receiving a second uniformity level to be achieved across the surface of the substrate;
- identifying a second plurality of duty cycles associated with a second plurality of states based on the second uniformity level, wherein the second plurality of states are of a second plurality of RF signals;
- and
- controlling a plurality of RF generators to generate the second plurality of RF signals having the second plurality of duty cycles to achieve the second uniformity level, wherein the second plurality of RF signals having the second plurality of duty cycles are generated by the RF generator that is coupled to a substrate support of a plasma chamber.
A controller for achieving a uniformity level in a processing rate across a surface of a substrate, comprising:
- a processor configured to:
- receive a first uniformity level to be achieved across the surface of the substrate;
- identify a first plurality of duty cycles associated with a first plurality of states based on the first uniformity level, wherein the first plurality of states are of a variable of a first radio frequency (RF) signal;
- receive a second uniformity level to be achieved across the surface of the substrate;
- identify a second plurality of duty cycles associated with a second plurality of states based on the second uniformity level, wherein the second plurality of states are of a variable of a second RF signal;
- and
- control an RF generator to generate the second RF signal having the second plurality of duty cycles to achieve the second uniformity level, wherein the second RF signal having the second plurality of duty cycles is generated by the RF generator that is coupled to a substrate support of a plasma chamber;
- and
- a memory device coupled to the processor, wherein the memory device is configured to store the first and second uniformity levels.
Dependencies are inferred from the claim text.