Cleaning brush for semiconductor fabrication process

A cleaning brush, comprising:

• a core comprising:
• a circumferential portion surrounding a rotation axis of the cleaning brush and defining an inlet opening for receiving a fluid and a closed end portion connected to an end of the circumferential portion that is opposite to the inlet opening along the rotation axis, wherein at least one elongated conduit is defined within the core and fluidly communicated with the inlet opening, and the circumferential portion includes a plurality of outlet channels passing therethrough to fluidly communicate with the elongated conduit, the outlet channels being tilted outwardly toward the closed end portion;
• and
• a brush member connected to an outer surface of the circumferential portion and covering all of the plurality of outlet channels,
• wherein each of the outlet channels includes an upstream section connected to the inner surface of the circumferential portion and at least one downstream section connected the upstream section to the outer surface of the circumferential portion, wherein the upstream section is tilted relative to the inner surface of the circumferential portion and the downstream section is perpendicular to the outer surface of the circumferential portion, and
• wherein a width (D) of the elongated conduit, a width (W11) of the upstream section of one of the outlet channels, and a width (W13) of the downstream section satisfy the following equations (1) and (2):
• D3=Σ(from k=0 to n)k(W11)3 (1)
• (W11)3=Σ(from i=0 to n)i(W13)3 (2)
• where k is the total number of the upstream sections, and i is the total number of the downstream sections.