Display panel having isolation layer with different thicknesses

A display panel, comprising:

• a substrate;
• a plurality of light-emitting structures disposed on the substrate;
• an obstruction layer disposed on the substrate and configured to prevent oxygen and vapor entering the display panel, the obstruction layer surrounding the plurality of light-emitting structures;
• an isolation layer disposed on the substrate and covering the plurality of light-emitting structures, wherein a first part of the isolation layer covers the obstruction layer;
• and
• an encapsulation layer disposed on the substrate and covering the isolation layer and the obstruction layer,
• wherein a thickness of the first part of the isolation layer covering the obstruction layer is less than a thickness of a second part of the isolation layer that does not cover the obstruction layer, the isolation layer comprises silicon oxide, the thickness of the first part of the isolation layer is less than or equal to 10 nanometers, and the thickness of the second part of the isolation layer ranges from 20 nanometers to 200 nanometers.