Array substrate with second common electrode layer and preparation method thereof, and display panel

A method for preparing an array substrate, comprising following steps:

• providing a substrate;
• preparing a thin film transistor layer on the substrate;
• preparing a planarization layer on a surface of a side of the thin film transistor layer away from the substrate;
• preparing a first common electrode layer on a surface of a side of the planarization layer away from the substrate;
• preparing a metal unit on a surface of a side of the first common electrode layer away from the substrate;
• and
• preparing a second common electrode layer on the metal unit and the surface of the side of the first common electrode layer away from the substrate;
• wherein a laminated structure consisting of the first common electrode layer, the metal unit, and the second common electrode layer is insulated from a thin film transistor of the thin film transistor layer;
• and wherein the orthographic projection of the metal unit on the substrate is within an orthographic projection of the thin film transistor layer on the substrate.

A display panel, comprising an array substrate, wherein the array substrate comprises:

• a substrate;
• a thin film transistor layer disposed on the substrate;
• a planarization layer disposed on a surface of a side of the thin film transistor layer away from the substrate;
• a first common electrode layer disposed on a surface of a side of the planarization layer away from the substrate;
• a metal unit disposed on a surface of a side of the first common electrode layer away from the substrate;
• and
• a second common electrode layer covering the metal unit and the surface of the side of the first common electrode layer away from the substrate;
• wherein a laminated structure consisting of the first common electrode layer, the metal unit, and the second common electrode layer is insulated from a thin film transistor of the thin film transistor layer;
• and wherein the orthographic projection of the metal unit on the substrate is within an orthographic projection of the thin film transistor layer on the substrate.