Plasma processing apparatus and plasma processing method
AssigneeTokyo Electron Limited
InventorsNatsumi Torii, Koichi Nagami
Life of this patent
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Abstract
A plasma processing apparatus includes: a chamber; a substrate support disposed in the chamber, the substrate support including a lower electrode; an edge ring disposed to surround a substrate on the substrate support; an upper electrode disposed above the substrate support; a first RF power supply; a first DC power supply; and a controller configured to cause: (a) starting supply of a first RF power from the first RF power supply to the upper electrode or the lower electrode; and (b) after (a), starting the application of a first DC voltage from the first DC power supply to the edge ring when a first delay time elapses.
Claims12
A plasma processing apparatus comprising:
- a chamber;
- a substrate support disposed in the chamber, the substrate support including a lower electrode;
- an edge ring disposed on the substrate support to radially surround a substrate on an upper surface of the substrate support;
- an upper electrode disposed above the substrate support;
- a first RF power supply;
- a switching unit including a DC power supply circuit and a charge removal circuit, the switching unit switching between the DC power supply circuit and the charge removal circuit;
- a first DC power supply electrically connected to the edge ring via the switching unit;
- and
- controller circuitry configured to cause:
- (a) starting supply of a first RF power from the first RF power supply to the upper electrode or the lower electrode;
- (b) after (a), starting the application of a first DC voltage from the first DC power supply to the edge ring when a first delay time elapses;
- (c) after (b), controlling the first DC power supply to stop the supply of the first RF power and the application of the first DC voltage;
- and
- (d) after (c), controlling the charge removal circuit to start charge removal of the edge ring when a second delay time elapses.
Dependencies are inferred from the claim text.