Substrate treating apparatus and substrate treating method
AssigneeSemes Co., Ltd.
InventorsHo Hun Lee, Yong Seok Jang
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AssigneeSemes Co., Ltd.
InventorsHo Hun Lee, Yong Seok Jang
Estimating the term…
Embodiments of the inventive concept provide a substrate treating apparatus and a substrate treating method for allowing a position of a substrate to be known with only an analysis of an image with respect to a light source irradiated to a surrounding of the substrate. The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to seat a substrate; a first light irradiation unit configured to irradiate a first light source to the substrate; an image acquisition unit configured to acquire an image information with respect to the first light source irradiated to the substrate; and an image analysis unit configured to detect a position of the substrate by inputting the image information and analyzing the first light source irradiated to the substrate within the image information which is input.
A substrate treating apparatus comprising:
A substrate treating apparatus comprising:
Dependencies are inferred from the claim text.