Chip-scale atomic beam generating systems

A method of generating a thermal atomic beam with an atomic beam system disposed in a chip or a chip-scale substrate comprising:

• stimulating an atomic vapor source comprising alkali atoms, alkali earth atoms, or molecules thereof to emit an atomic vapor in a first chamber having a first internal pressure;
• passively collimating the atomic vapor in an array of channels to generate the thermal atomic beam;
• interrogating the thermal atomic beam in free propagation in a second chamber having a second internal pressure;
• and
• creating a pressure differential between the first and second chambers, the second chamber having a second internal pressure less than the first internal pressure;
• wherein:
• the creating comprises using one or more passive pumps configured to, at least in part, create the pressure differential between the first and second chambers;
• and
• the one or more pumps are selected from a group consisting of one or more non-evaporable getter pumps, one or more pumps comprising graphite, and a combination thereof.

An atomic beam system disposed in a chip or a chip-scale substrate comprising:

• an atomic vapor source chamber configured to emit an atomic vapor comprising atoms used to generate a thermal atomic beam from the atomic vapor;
• channels having lengths defined from first ends to second ends, the first ends in fluid communication with the atomic vapor source chamber, the channels configured to passively collimate the atomic vapor as it moves through the lengths of the channels and generating the thermal atomic beam;
• a propagation chamber in fluid communication with the second ends of the channels, the propagation chamber configured to have an internal pressure less than an internal pressure of the atomic vapor source chamber to enable the thermal atomic beam to freely propagate through the propagation chamber;
• and
• one or more pumps configured to cause the internal pressure of the propagation chamber to be less than the internal pressure of the atomic vapor source chamber;
• wherein:
• the atomic beam system is configured to enable the thermal atomic beam to be interrogated in free propagation;
• the passive collimation of the atomic vapor is based, at least in part, by one or more properties of the channels;
• and
• the one or more pumps are selected from a group consisting of one or more passive non-evaporable getter pumps, one or more passive pumps comprising graphite, and a combination thereof.

A method comprising:

• stimulating an atomic vapor source to emit an atomic vapor in a first chamber of an atomic beam system disposed in a chip or a chip-scale substrate, the first chamber having a first internal pressure;
• passively collimating the atomic vapor in an array of channels of the atomic beam system to generate a thermal atomic beam;
• interrogating the thermal atomic beam in free propagation in a second chamber of the atomic beam system;
• and
• inducing a pressure differential between the first and second chambers, the second chamber having a second internal pressure less than the first internal pressure;
• wherein:
• the inducing comprises using one or more passive pumps configured to, at least in part, induce the pressure differential between the first and second chambers;
• and
• the one or more pumps are selected from a group consisting of one or more passive non-evaporable getter pumps, one or more passive pumps comprising graphite, and a combination thereof.