Metrology method and apparatus
AssigneeASML Netherlands B.V.
InventorsArjan Johannes Anton Beukman, Omar El Gawhary, Ilse Van Weperen, Pieter Joseph Marie Wöltgens
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AssigneeASML Netherlands B.V.
InventorsArjan Johannes Anton Beukman, Omar El Gawhary, Ilse Van Weperen, Pieter Joseph Marie Wöltgens
Estimating the term…
Disclosed is a method for measuring alignment on an alignment mark, and associated apparatuses. The method comprises illuminating the alignment mark with illumination comprising at least one wavelength; capturing the scattered radiation scattered from the alignment mark as a result of said illumination step, and determining at least one position value for said alignment mark from an angularly resolved representation of said scattered radiation, wherein said alignment mark, or a feature thereof, is smaller than said at least one wavelength in at least one dimension of a substrate plane.
A method for measuring alignment on an alignment mark, the method comprising:
Dependencies are inferred from the claim text.