System for supplying photoresist and method for managing photoresist

A system for supplying a photoresist, the system comprising:

• a pressure adjustment container provided to a supply line connected from a chemical liquid bottle to a first tank,
• an opening/closing valve provided on an upstream of the pressure adjustment container, and opening/closing a flow path in which the photoresist flows;
• and
• a controller,
• wherein the pressure adjustment container includes
• a housing having a space formed therein,
• a separator separating the space of the housing into a first space and a second space,
• an inflow port making a photoresist flow in the first space,
• a discharge port discharging the photoresist from the first space, and
• a pressurized fluid inflow port supplying a pressurized fluid to the second space, and
• a volume of the first space varies depending on the supply of the pressurized fluid,
• wherein the controller when the photoresist is transmitted from the chemical liquid bottle to the first tank,
• controls the first space to have a first volume, and
• when the transmission of the photoresist from the chemical liquid bottle to the first tank is stopped,
• closes the opening/closing valve, and controls the first space to have a second volume by controlling the supply of the pressurized fluid, and
• the second volume is larger than the first volume.