Negative photosensitive resin composition

Abstract

Provided is a negative photosensitive resin composition. The negative photosensitive resin composition contains a polymer and a photo-radical generator. The polymer includes a structural unit (I) represented by formula (I), shown below, and a structural unit (II) represented by formula (II), shown below. In formula (I), R1 to R3 each indicate, independently of one another, a hydrogen atom, an alkyl group, or an aromatic ring group, R1 to R3 may be bonded to form a ring, R4 indicates a hydrogen atom or an alkyl group, X indicates an alkylene group having a carbon number of 1 to 10, and m indicates 0, 1, or 2. In formula (II), R5 to R8 each indicate, independently of one another, a hydrogen atom, an alkyl group, or an aromatic ring group, R5 to R8 may be bonded to form a ring, and n indicates 0, 1, or 2.

Dependencies are inferred from the claim text.