Scanning mirror systems and methods of manufacture
AssigneeMagic Leap, Inc.
InventorsJulien Gamet, Stephan Arthur Gamper
Life of this patent
Estimating the term…
Abstract
A scanning micromirror system includes a base having an axis passing therethrough, a plurality of support flexures coupled to the base, and a platform coupled to the base by the plurality of support flexures. The platform has a first side and a second side opposing the first side and is operable to oscillate about the axis. The scanning micromirror system also includes a stress relief layer positioned on the first side of the platform and a reflector positioned on the first side of the platform. The stress relief layer is positioned between the reflector and the platform.
Claims19
A scanning micromirror system comprising:
- a base having an axis passing therethrough;
- a plurality of support flexures coupled to the base;
- a platform coupled to the base by the plurality of support flexures, wherein the platform has a first side and a second side opposing the first side and is operable to oscillate about the axis;
- a stress relief layer positioned on the first side of the platform, wherein the stress relief layer provides a first stress distribution on the first side of the platform;
- a conducting coil positioned on the second side of the platform, wherein the conducting coil provides a second stress distribution on the second side of the platform, and wherein the first stress distribution and the second stress distribution are opposite;
- and
- a reflector positioned on the first side of the platform, wherein the stress relief layer is positioned between the reflector and the platform.
A method of projecting an image, the method comprising:
- providing a scanning micromirror system, wherein the scanning micromirror system comprising:
- a base having an axis passing therethrough;
- a plurality of support flexures coupled to the base;
- a platform coupled to the base by the plurality of support flexures, wherein the platform has a first side and a second side opposing the first side and is operable to oscillate about the axis;
- a stress relief layer positioned on the first side of the platform, wherein the stress relief layer provides a first stress distribution on the first side of the platform;
- and
- a reflector positioned on the first side of the platform, wherein the stress relief layer is positioned between the reflector and the platform;
- a conducting coil positioned on the second side of the platform, wherein the conducting coil is arranged to apply magnetic forces to the platform about the axis, wherein the conducting coil provides a second stress distribution on the second side of the platform, and wherein the first stress distribution and the second stress distribution are opposite;
- and
- a magnetic field source arranged to apply a magnetic field to the platform;
- inducing an oscillation of the scanning micromirror system at a frequency;
- and
- illuminating the reflector with a light source to generate output reflected light.
Dependencies are inferred from the claim text.