Photocurable composition with high silicon content
AssigneeCanon Kabushiki Kaisha
InventorsFen Wan, Weijun Liu
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Abstract
A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one silicon-containing monomer having a structure of formula (1) with R1, R2: —O—Si(CH3)3, alkyl, aryl, or alkylaryl; R3, R4: —O—Si(CH3)3, alkyl, aryl, or alkylaryl; R5: C1-C5-alkyl, aryl, alkylaryl; R6: —R5-X, or X, or —O—Si(CH3)3, or alkyl, or aryl, or alkylaryl; X: acrylate or methacrylate; and n: 0-4. The amount of silicon (Si) in the photocurable composition can be at least 15 wt % based on the total weight of the photocurable composition.
Claims20
A photocurable composition comprising a polymerizable material and a photoinitiator, wherein
- the polymerizable material comprises at least one silicon-containing monomer having a structure of formula (1)
- with R1, R2:
- —O—Si(CH3)3, alkyl, aryl, or alkylaryl
- R3, R4:
- —O—Si(CH3)3, alkyl, aryl, or alkylaryl
- R5:
- C1-C5-alkyl, aryl, alkylaryl
- R6:
- —R5-X, or X, or —O—Si(CH3)3, or alkyl, or aryl, or alkylaryl
- X:
- acrylate or methacrylate
- n:
- 0-4;
- an amount of silicon (Si) in the photocurable composition is at least 15 wt % based on the total weight of the photocurable composition;
- and
- a viscosity of the photocurable composition is not greater than 20 mPa·s.
A method of forming a photo-cured layer on a substrate, comprising:
- applying a layer of a photocurable composition on the substrate, wherein the photocurable composition comprises a polymerizable material and at least one photoinitiator, wherein
- the polymerizable material comprises at least one silicon-containing monomer having a structure of formula (1)
- with R1, R2:
- —O—Si(CH3)3, alkyl, aryl, or alkylaryl
- R3, R4:
- —O—Si(CH3)3, alkyl, aryl, or alkylaryl
- R5:
- C1-C5-alkyl, aryl, alkylaryl
- R6:
- —R5-X, or X, or —O—Si(CH3)3, or alkyl, or aryl, or alkylaryl
- X:
- acrylate or methacrylate
- n:
- 0-4;
- and
- an amount of silicon (Si) in the photocurable composition is at least 15 wt % based on the total weight of the photocurable;
- bringing the photocurable composition into contact with a template or a superstrate;
- irradiating the photocurable composition with light to form a photo-cured layer;
- and
- removing the template or the superstrate from the photo-cured layer.
A method of manufacturing an article, comprising:
- applying a layer of a photocurable composition on a substrate, wherein the photocurable composition comprises a polymerizable material and at least one photoinitiator, wherein
- the polymerizable material comprises at least one silicon-containing monomer having a structure of formula (1)
- with R1, R2:
- —O—Si(CH3)3, alkyl, aryl, or alkylaryl
- R3, R4:
- —O—Si(CH3)3, alkyl, aryl, or alkylaryl
- R5:
- C1-C5-alkyl, aryl, alkylaryl
- R6:
- —R5-X, or X, or —O—Si(CH3)3, or alkyl, or aryl, or alkylaryl
- X:
- acrylate or methacrylate
- n:
- 0-4;
- and
- an amount of silicon (Si) in the photocurable composition is at least 15 wt % based on the total weight of the photocurable composition;
- bringing the photocurable composition into contact with a template or a superstrate;
- irradiating the photocurable composition with light to form a photo-cured layer;
- removing the template or the superstrate from the photo-cured layer;
- forming a pattern on the substrate;
- processing the substrate on which the pattern has been formed in the forming;
- and
- manufacturing the article from the substrate processed in the processing.
A photocurable composition comprising a polymerizable material and a photoinitiator, wherein
- the polymerizable material comprises at least one silicon-containing monomer having a structure of formula (1)
- with R1, R2:
- —O—Si(CH3)3, alkyl, aryl, or alkylaryl
- R3, R4:
- —O—Si(CH3)3, alkyl, aryl, or alkylaryl
- R5:
- C1-C5-alkyl, aryl, alkylaryl
- R6:
- —R5-X, or X, or —O—Si(CH3)3, or alkyl, or aryl, or alkylaryl
- X:
- acrylate or methacrylate
- n:
- 0-4;
- an amount of silicon (Si) in the photocurable composition is at least 15 wt % based on the total weight of the photocurable composition;
- and
- the at least one silicon-containing monomer includes methacryloxymethyltris(trimethylsiloxane)silane (SiM1), 1,3-bis(3-methacryloxypropyl)tetrakis(trimethylsiloxy)disiloxane (SiM2), 3-acryloxypropyl-tris(trimethylsiloxy)silane (SiM3), or any combination thereof.
Dependencies are inferred from the claim text.