Home port and a substrate-treating apparatus for exhausting fume from a treatment liquid

An apparatus for treating a substrate, the apparatus comprising:

• a liquid treating chamber configured to treat a substrate with a liquid;
• a home port provided outside a treating unit of the liquid treating chamber;
• and
• a nozzle unit supplying a treating liquid to a substrate positioned in the treating unit, and having a nozzle provided to be movable between a process location at which the treating unit performs the liquid-treating for the substrate and a waiting location of waiting in the home port,
• wherein the home port includes:
• a drain cup having an accommodation space accommodating the treating liquid ejected from the nozzle;
• a housing provided to cover the drain cup and having an exhaust space which exhausts fumes generated from the treating liquid;
• a first exhaust passage and a second exhaust passage through which the fumes generated from the treating liquid in the drain cup flows to the exhaust space are provided in the home port, wherein the second exhaust passage is positioned above the first exhaust passage, and
• an insertion body having a through hole penetrated in a vertical direction,
• wherein the exhaust space includes a first exhaust space and a second exhaust space, and
• wherein the housing further includes:
• an inner housing placed to cover the drain cup, and having the first exhaust space from the drain cup, and
• an outer housing placed to cover the inner housing, and having the second exhaust space from the inner housing,
• wherein the fumes which flow through the first exhaust passage are connected to the first exhaust space,
• wherein the second exhaust passage is connected to the second exhaust space,
• wherein the insertion body has a body,
• wherein the body is placed at a location higher than the drain cup and lower than the upper wall of the outer housing,
• wherein a first clearance between the body and the drain cup is provided as the first exhaust passage, and
• wherein a second clearance between the body and the upper wall of the outer housing is provided as the second exhaust passage.

An apparatus for treating a substrate, the apparatus comprising:

• a liquid treating chamber configured to treat a substrate with a liquid;
• a home port provided outside a treating unit of the liquid treating chamber;
• and
• a nozzle unit supplying a treating liquid to a substrate positioned in the treating unit, and having a nozzle provided to be movable between a process location at which the treating unit performs the liquid-treating for the substrate and a waiting location of waiting in the home port,
• wherein the home port includes:
• a drain cup having an accommodation space accommodating the treating liquid ejected from the nozzle,
• a housing provided to cover the drain cup and having an exhaust space which exhausts fumes generated from the treating liquid, and
• an insertion body placed between an upper wall of the housing and the drain cup in the housing,
• wherein a first exhaust passage guiding fumes to the exhaust space is formed between the insertion body and the drain cup,
• wherein a second exhaust passage guiding the fumes to the exhaust space is formed between the insertion body and the housing,
• wherein the second exhaust passage is provided at a higher location than the first exhaust passage,
• wherein an exhaust pipe in which a depressurization member is installed is connected to the exhaust space,
• wherein an exhaust route from the first exhaust passage up to the exhaust pipe is provided to be shorter than an exhaust route from the second exhaust passage up to the exhaust pipe,
• wherein the insertion body has a through hole penetrated in a vertical direction,
• wherein the housing includes:
• a lower body covering a side portion and a lower portion of the drain cup;
• and
• an upper body positioned above the lower body, and
• wherein the insertion body further includes:
• a support base;
• and
• connection rods connecting the insertion body and the support base,
• wherein an upper end of the lower body is positioned to be higher than an upper end of the drain cup,
• wherein a bottom of the support base is supported by the lower body,
• wherein the upper body is supported by the support base, and
• wherein fumes exhausted through the second exhaust passage is provided to flow to the exhaust space through a space between the connection rods.