Molybdenum imido alkyl/allyl complexes for deposition of molybdenum-containing films

A method of vapor phase depositing a Mo or Cr containing material on a surface, the method comprising:

• a) providing a substrate having a surface, and
• b) exposing the substrate to a vapor phase of a composition comprising a chemical suitable for use as a volatile precursor for vapor phase depositions of Mo or Cr containing materials, the chemical represented by one of the following formulae:
• wherein for both formulae,
• M is Cr or Mo;
• R1, and R2 each is independently selected from H, C1-C6 linear alkyl, C1-C6 branched alkyl, C1-C6 cyclic alkyl, C1-C6 alkenyl, C1-C6 alkylphenyl, C1-C6 alkenylphenyl, Aryl, or —SiRxRyRz, wherein Rx, Ry, and Rz each is independently selected from H, C1-C6 linear alkyl, C1-C6 branched alkyl, C1-C6 cyclic alkyl, C1-C6 alkenyl, C1-C6 alkylphenyl, C1-C6 alkenylphenyl, Aryl, F, CI, Br, and I;
• and
• R3, R4, R5, R6, R7, R8, and in formula two R9, R10, R11, and R12, each is independently selected from H, C1-C6 linear alkyl, C1-C6 branched alkyl, C1-C6 cyclic alkyl, C1-C6 alkenyl, C1-C6 alkylphenyl, C1-C6 alkenylphenyl, Aryl, vinyl, or —SiRxRyRz;
• wherein Rx, Ry, and Rz each is independently selected from H, C1-C6 linear alkyl, C1-C6 branched alkyl, C1-C6 cyclic alkyl, C1-C6 alkenyl, C1-C6 alkylphenyl, C1-C6 alkenylphenyl, Aryl, F, CI, Br, and I, under conditions suitable to form a deposited material, having the Mo or Cr, on the surface.