Hydrophilic anti fog film layer, preparation method therefor, and application and product thereof

A hydrophilic anti-fog film layer, formed on a surface of a substrate by a plasma chemical vapor deposition using a titanium dioxide precursor source and a non-metal doping source as reaction raw materials, wherein the titanium dioxide precursor source comprises one or two selected from a group consisting of:

• a titanium-based source compound with an oxygen-based source, and a titanium-oxygen organic compound;
• wherein the non-metal doping source is selected from a group consisting of:
• alkane, alkene, ethyne (C2H2), CxF2x+2, and CxF2x, wherein X is a number ranging from 1 to 6;
• the plasma chemical vapor deposition is conducted at a pressure ranging from 10 mTorr to 300 mTorr and at a temperature ranging from 30° C. to 60° C., and the plasma chemical vapor deposition comprises a pretreatment stage and a coating stage, in the pretreatment stage, a plasma discharge power ranges from 150 W to 600 W, and a discharge duration time ranges from 60 s to 450 s, and then in the coating stage, the plasma discharge power ranges from 10 W to 200 W, and the discharge duration time ranges from 600 s to 7200 s;
• and
• a water contact angle of the hydrophilic anti-fog film layer under visible light is not greater than 10°, and the contact angle stays at an original level after being placed under visible light for 6 months.