Back to results
US 12,588,683 B2Granted
Systems and methods for reactive gas-based product treatment
AssigneeClean Crop Technologies, Inc.
InventorsKevin Keener, Daniel White, Daniel Cavanaugh, Yaqoot Shaharyar
Life of this patent
Estimating the term…
Abstract
Systems and methods disclosed herein provide an improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse effects on quality. The system is operationally efficient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, the system obviates the need for further containerization or packaging of product during pasteurization processing.
Claims18
A method, comprising:
- transferring a feed gas and a product to a chamber;
- moving the product through the chamber;
- activating a set of cold plasma reactors to generate a plasma within the chamber that diffuses through the chamber and ionizes the feed gas to generate multiple reactive gas species (RGS) such that the multiple RGS contact the product,
- the set of cold plasma reactors including a first cold plasma reactor and a second cold plasma reactor operatively disposed on a first side and a second side of the chamber, each of the first cold plasma reactor and the second cold plasma reactor including:
- a first electrode and a second electrode separated by an air gap, the first electrode disposed closer than the second electrode to a wall of the chamber,
- a dielectric layer disposed between the first electrode and the second electrode, and
- an exterior insulator interposed between the first electrode and the chamber,
- the dielectric layer and the exterior insulator being perforated to permit gas communication between the chamber and the air gap,
- the product is moved through the chamber such that, for a first period of time, the product moves below the first cold plasma reactor and above the second cold plasma reactor through a region of high concentration of RGS generated by the first and second cold plasma reactors;
- and
- maintaining the product and the multiple RGS in the chamber for a second period of time such that the product is decontaminated by the multiple RGS.
8 more elements
A method, comprising:
- transferring a feed gas to a chamber, the chamber including a plurality of cold plasma reactors disposed therein, each cold plasma reactor at least partially defining a treatment zone;
- moving a product disposed on a surface through the chamber from an input to an outlet such that the product is in the chamber for a period of time;
- activating at least a first cold plasma reactor of the plurality of cold plasma reactors on a first side of the product and a second cold plasma reactor of the plurality of cold plasma reactors on a second side of the product to generate a plasma that ionizes the feed gas to generate multiple reactive gas species (RGS) such that the product is decontaminated by the multiple RGS, the surface being disposed adjacent to where the plasma is generated such that the product moves through a region of high concentration of the multiple RGS, each of the first cold plasma reactor and the second cold plasma reactor including:
- a first electrode and a second electrode separated by an air gap, the first electrode disposed closer than the second electrode to a wall of the chamber,
- a dielectric layer disposed between the first electrode and the second electrode, and
- an exterior insulator interposed between the first electrode and the chamber,
- the dielectric layer and the exterior insulator being perforated to permit gas communication between the chamber and the air gap;
- and
- after the product has been decontaminated, discharging the product from the chamber via the outlet.
6 more elements
A method, comprising:
- transferring a feed gas to a chamber, the chamber including a first cold plasma reactor configured to be disposed on a first side of a product and a second cold plasma reactor configured to be disposed on a second side of thea product opposite the first side, each cold plasma reactor including:
- a first electrode and a second electrode separated by an air gap, the first electrode disposed closer than the second electrode to a wall of the chamber,
- a dielectric layer disposed therebetween the first electrode and the second electrode, and
- an exterior insulator disposed between the first electrode the chamber,
- the dielectric layer and the exterior insulator being perforated to permit gas communication between the chamber and the air gap;
- moving the product through the chamber from an input to an outlet such that the product is in the chamber for a period of time;
- activating the first cold plasma reactor and the second cold plasma reactor when the product is at least partially disposed therebetween to generate a plasma that ionizes the feed gas to generate multiple reactive gas species (RGS) such that the product is decontaminated by the multiple RGS;
- and
- after the product has been decontaminated, discharging the product from the chamber.
6 more elements
Dependencies are inferred from the claim text.