Reflector plate for substrate processing

A reflector plate assembly for processing a substrate, comprising:

• a reflector plate having a first surface, wherein the first surface is a bare, polished, uncoated surface;
• a reflector disk embedded within the reflector plate from the first surface;
• a coating layer on the reflector disk;
• a pyrometer disposed through an opening of the reflector disk;
• and
• an encapsulating layer on the coating layer.

A chamber for processing a substrate, comprising:

• a chamber body;
• a chamber lid disposed on the chamber body, the chamber lid comprising:
• a lid body;
• and
• a reflector plate assembly, the reflector plate assembly, comprising:
• a reflector plate having a first surface, wherein the first surface is a bare, polished, uncoated surface;
• a plurality of reflector disks embedded within the reflector plate from the first surface;
• a coating layer on each reflector disk of the plurality of reflector disks;
• a plurality of pyrometers, wherein each pyrometer of the plurality of pyrometers is disposed through an opening of a reflector disk of the plurality of reflector disks;
• and
• an encapsulating layer on the coating layer.