Liquid chemical supply apparatus and liquid chemical supply system

A liquid chemical supply system for supplying a liquid chemical to a plurality of substrate processing apparatuses disposed at different heights, the liquid chemical supply system comprising a liquid chemical supply apparatus and a liquid chemical storage apparatus,

• wherein the liquid chemical supply apparatus comprises:
• a pump for providing a hydraulic pressure for moving the liquid chemical from the liquid chemical storage apparatus to the plurality of substrate processing apparatuses;
• a plurality of liquid chemical supply lines having ends connected to the pump and other ends separately connected to the plurality of substrate processing apparatuses, to provide passages through which the liquid chemical moves;
• a pump vent line connected to the pump to discharge some of the liquid chemical to outside;
• and
• a plurality of flow rate calibration lines connecting the pump vent line to the plurality of liquid chemical supply lines, respectively.

A liquid chemical supply apparatus for supplying a liquid photoresist to a plurality of substrate processing apparatuses disposed at different heights, the liquid chemical supply apparatus comprising:

• a pump for providing a hydraulic pressure for moving the liquid photoresist to the plurality of substrate processing apparatuses;
• a plurality of liquid chemical supply lines having ends connected to the pump and other ends separately connected to the plurality of substrate processing apparatuses, to provide passages through which the liquid photoresist moves;
• a pump vent line connected to the pump to discharge some of the liquid photoresist to outside, wherein the other ends of the plurality of liquid chemical supply lines are located at different heights;
• a plurality of flow rate calibration lines connecting the pump vent line to the plurality of liquid chemical supply lines, respectively;
• and
• a check valve for controlling a flow rate of the liquid photoresist discharged to the pump vent line,
• wherein the check valve is mounted on at least one flow rate calibration line of the plurality of flow rate calibration lines, and includes a liquid chemical passage of the check valve with a width less than a width of the liquid chemical passage of the at least one flow rate calibration line, and
• wherein a difference between amounts of the liquid photoresist supplied to the plurality of substrate processing apparatuses through the plurality of flow rate calibration lines is calibrated to vary within 10%.