Overlay correction for advanced integrated-circuit devices

A system to correct overlay errors in a multi-layer process, the system comprising:

• a measurement tool configured to:
• receive a substrate with a first plurality of features provided at a plurality of locations on a first layer;
• measure an x-coordinate offset and a y-coordinate offset of the first plurality of features on the first layer;
• and
• send correction information to a photolithographic exposure tool;
• wherein the measurement tool is to receive the substrate with a second plurality of features on a second layer and to measure an x-coordinate offset and a y-coordinate offset of the second plurality of features on the second layer with reference to a select location of the plurality of locations associated with at least one of the first plurality of features and defined x-coordinates and y-coordinates for the at least one of first plurality of features on the substrate and to send the correction information for the x-coordinate offset and the y-coordinate offset of the second plurality of features back to the photolithographic exposure tool prior to exposing a third layer.